Nucleation and Atomic Layer Reaction in Nickel Silicide for Defect-Engineered Si Nanochannels

Authors
Wei Tang, S. Tom Picraux, Jian Yu Huang, Andriy M. Gusak, King-Ning Tu, Shadi A. Dayeh
doi
10.1021/nl400949n
Identifier
48
Volume
13
Pages
2748-2753
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BibTeX
@article{iebl_2013_48,
title = "{Nucleation and Atomic Layer Reaction in Nickel Silicide for Defect-Engineered Si Nanochannels}",
author = "{Wei Tang, S. Tom Picraux, Jian Yu Huang, Andriy M. Gusak, King-Ning Tu, Shadi A. Dayeh}",
journal = "{Nano Letters}",
volume = "{13}",
number = "{6}",
year = "{2013}",
}
Publication Year
2013
Publication Type
Journal Articles
Journal
Nano Letters